Fabrication Technique of High Density Quantum-Wire Arrays by Photolithography and Metalorganic Chemical Vapor Deposition

We have fabricated GaAs quantum-wire arrays by using photolithography and metalorganic chemical vapor deposition (MOCVD). Multiple quantum-wire structures with lateral dimensions less than 200 Å×1200 Å have been obtained. An area filling factor greater than 50% can be achieved.