光致发光
透射电子显微镜
缓冲器(光纤)
材料科学
合金
位错
变质岩
线程(蛋白质序列)
光电子学
复合材料
化学
纳米技术
地质学
计算机科学
生物化学
电信
蛋白质结构
地球化学
作者
Yi Gu,Yonggang Zhang,Kai Wang,Xiang Fang,Kehui Liu
标识
DOI:10.1143/jjap.51.080205
摘要
In this work, the threading dislocation suppression effects of InAs/In 0.52 Al 0.48 As digital alloy intermediate layers in an InP-based InAlAs graded metamorphic buffer were investigated to improve the structural and optical qualities of the buffer. Cross-sectional transmission electron microscopy, atomic force microscopy, and photoluminescence measurements proved that the insertion of thin digital alloy layers in the graded buffer markedly improves the surface quality, decreases the threading dislocation density, and enhances the photoluminescence efficiency of In 0.8 Ga 0.2 As/In 0.8 Al 0.2 As quantum wells. This study shows great potentials by incorporating digital alloy intermediate layers in metamorphic buffers to improve the quality of metamorphic devices.
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