Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

Nanosphere lithography (NSL) has been studied as the effective method of fabricating nano-scale array. This paper presents template-assisted NSL to obtain high-quality crystal in regularity and coverage. A periodic array of 100 nm deep nano trenches with two different widths, 400 and 450 nm was fabricated by nano imprint lithography (NIL), and used as the template. When polystyrene nanospheres with the diameter of 100 nm were spin-coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in both lateral and longitudinal directions. We also demonstrated nanowell array through subsequent deposition and etching steps.