Synthesis of Si<sub>3</sub>N<sub>4</sub>/Polyimide Hybrid Films

Si3N4/polyimide hybrid films based on 4,4-oxydianiline (ODA) and pyromellitic dianhydride(PMDA) were prepared by incorporation with different content of nano-sized Si3N4. In this study, the effect of Si3N4 on the microstructure of the Si3N4/polyimide film was characterized by Fourier Transform Infrared Spectrometry (FTIR), scanning electron microscope (SEM). The dependence of mechanical properties and thermal stability of the Si3N4/polyimide film were also investigated. The hardness from unload of the Si3N4/polyimide film were expressly investigated for the first time.