材料科学
薄板电阻
退火(玻璃)
分压
无定形固体
复合材料
氧化铟锡
微晶
薄膜
陶瓷
图层(电子)
电阻率和电导率
溅射沉积
溅射
分析化学(期刊)
冶金
氧气
纳米技术
结晶学
化学
有机化学
工程类
色谱法
电气工程
作者
Michael Boehme,C. Charton
标识
DOI:10.1016/j.surfcoat.2005.02.040
摘要
Abstract Thin films of indium tin oxide (ITO) were deposited onto plastic web (PET) by reactive DC magnetron sputtering from a ceramic target of In 2 O 3 /SnO 2 (90:10). The layer thickness and partial pressure of H 2 O were varied. After coating, the PET was heated up to 175 °C by various annealing steps. The films were then examined by XRD, SEM, UV/VIS/NIR spectroscopy, and optical light microscopy. The sheet resistivity was also measured. With a low H 2 O partial pressure of 3.2 · 10 −5 Pa, polycrystalline ITO layers were deposited. At a higher H 2 O partial pressure of 3.06 · 10 −3 Pa, the ITO layers were grown with an amorphous structure. Shrinkage of the PET substrate during the annealing process initiated severe cracking in the ITO layer. The magnitude of crack formation was found to depend on three parameters; annealing temperature, layer structure, and layer thickness. Moreover, crack formation decreased the ITO film quality by increasing the sheet resistance.
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