原子层沉积
纳米团簇
X射线光电子能谱
扫描电子显微镜
材料科学
扫描隧道显微镜
薄膜
图层(电子)
沉积(地质)
金属
单层
化学工程
岛屿生长
分析化学(期刊)
纳米技术
化学
冶金
生物
外延
工程类
古生物学
复合材料
色谱法
沉积物
作者
Ziyu Zhang,Matthew C. Patterson,Maoming Ren,Ying Wang,John Flake,Phillip Sprunger,Richard L. Kurtz
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2012-12-19
卷期号:31 (1)
被引量:8
摘要
The properties of ALD-grown ZnO thin films on Cu clusters supported on ZnO(101¯0) have been studied with scanning tunneling and scanning electron microscopy in combination with angle-resolved x-ray photoelectron spectroscopy. Deposition at room temperature of two monolayers of Cu on ZnO(101¯0) results in metallic Cu0 clusters ∼8 nm wide by 1.4 nm high. Higher coverages of 15 ML results in a similar morphology, with slightly larger cluster sizes. Following air-exposure and ALD-growth of two cycles of ZnO, the Cu exhibits Cu+ species characteristic of Cu2O and the thin ZnO coating is hydroxylated. Electrochemical studies of ALD ZnO coatings on Cu suggest that they are more active for CO2 reduction.
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