300-W XeCl excimer laser annealing techniques in low-temperature polysilicon technology

The most recent development in industrial fabrication processes of low temperature poly-silicon by means of excimer laser and optics system is presented: . The recently developed high performance excimer laser, which delivers the highest output power currently commercially available in combination with two different beam shaping methods, the commonly known ELA-technique and the new SLS-technique for enhanced Field effect mobiliiy in the LTPS, is demonstrated.