异质结
制作
材料科学
光电子学
带隙
凝聚态物理
带材弯曲
外延
可视化
弯曲
电子能带结构
工作(物理)
接口(物质)
格子(音乐)
量子
纳米技术
收缩率
宽禁带半导体
作者
Xiangshi Ren,Shihao Hu,Genyu Hu,Wuyi Gao,Yun Zhang,Songdi Liu,Yuxuan Luo,Tianshu Zhang,Tianyu Dai,Yusen Wang,J. Li,Ziqiang Xu,Zhixin Hu,Yan Shao,Xinyu Wu
标识
DOI:10.1021/acs.jpclett.5c03549
摘要
As a fundamental characteristic, interfacial band evolution exerts a profound impact on the performance of heterostructures, especially the two-dimensional (2D) lateral heterostructure, which is anticipated with its excellent interfacial properties. Despite intensive reports on semiconductors, studies on 2D electron-correlated heterostructures, which hold big expectations for quantum devices, remain in their early stages on limited materials, hindered by the lack of a controllable fabrication strategy. Here, we report the laterally epitaxial fabrication of the 1T-NbSe2/1T-VSe2 heterostructure and the visualization of the band evolution at its electron-correlated interface. With designed parameters, the 2D VSe2 was successfully grown adjacent to the presynthesized 1T-NbSe2. Atomic-resolution characterizations reveal a well-aligned atomic lattice at the interface. A continuous band profile, particularly the gentle interfacial evolution of the Mott-Hubbard bands, was visualized at the interface, showing the gradual band bending of the upper Hubbard band (∼0.026 eV) and a shrinkage of the Mott-Hubbard gap from 0.124 eV with a decay length of ∼2.4 nm. Our work offers an essential strategy for the fabrication and visualization of 2D electron-correlated heterostructures, laying the groundwork for their fundamental study and future applications.
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