频谱分析仪
等离子体
离子源
辉光放电
材料科学
局部放电
氩
离子
电压
等离子体处理
分析化学(期刊)
原子物理学
光电子学
化学
光学
电气工程
物理
工程类
色谱法
有机化学
量子力学
作者
Sergey N. Grigoriev,Sergej Dosko,Alexey Vereschaka,Vsevolod Zelenkov,Catherine Sotova
出处
期刊:Coatings
[MDPI AG]
日期:2023-01-11
卷期号:13 (1): 147-147
被引量:8
标识
DOI:10.3390/coatings13010147
摘要
This article discusses the possibilities of two methods for monitoring Physical Vapor Deposition (PVD) process parameters: multi-grid probe, which makes it possible, in particular, to determine the energy distribution of ions of one- or two-component plasma and spectrum analyzer of the glow discharge plasma electromagnetic radiation signal based on the Prony–Fourier multichannel inductive spectral analysis sensor. The energy distribution curves of argon ions in the low-voltage operation mode of ion sources with closed electron current have been analyzed. With a decline in the discharge current, the average ion energy decreases, and the source efficiency (the ratio of the average ion energy W to the discharge voltage U) remains approximately at the same level of W/U ≈ 0.68, …, 0.71 in the operating voltage range of the source. The spectrum analyzer system can obtain not only the spectra at the output of the sensor, but also the deconvolution of the spectrum of the electromagnetic radiation signal of the glow discharge plasma. The scheme of a spectrum analyzer is considered, which can be used both for monitoring and for controlling the processing process, including in automated PVD installations.
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