Ultrawide-band optically transparent antidiffraction metamaterial absorber with a Thiessen-polygon metal-mesh shielding layer

材料科学 光学 光电子学 超材料 电磁屏蔽 衍射 物理 复合材料
作者
Naitao Song,Qiao Sun,Su Xu,Dongzhi Shan,Yang Tang,Xiaoxi Tian,Nianxi Xu,Jingsong Gao
出处
期刊:Photonics Research [Optica Publishing Group]
卷期号:11 (7): 1354-1354 被引量:12
标识
DOI:10.1364/prj.486613
摘要

Transparent absorbers, with a functional integration of broadband electromagnetic shielding, microwave camouflage, and optical transparency, have attracted increasing attention in the past decades. Metal mesh, an artificial, optically transparent, conducting material composed of periodic metallic gratings, is the optimal choice for the microwave shielding layer of transparent absorbers because of its excellent compatibility between high transparency and low resistance. However, the micrometer-level periodicity of metallic grating concentrates the diffraction of light, which degrades the imaging quality of cameras and sensors in common. In this study, we report on a generalized Thiessen-polygon-randomization method that prevents the concentration of the diffraction of light in periodic metallic grating and demonstrate an ultrawide-band optically transparent diffraction-immune metamaterial absorber. The absorber is constructed with a multilayer indium-tin-oxide-based metasurface and a Thiessen-polygon-randomized metal-mesh reflector. The lossy metasurface provides multimode absorption, whereas the Thiessen-polygon randomization prevents the concentration of the diffraction of light. The practical sample achieves a 10 dB absorptivity and shielding effectiveness over a range of 8–26.5 GHz, and the optical transparency is also preserved over the entire visible and near-infrared regions. The point spread function and field of view are both improved by using the antidiffraction absorber. Our study paves the way for the application of optically transparent electromagnetic devices, display, and optoelectronic integration in a more practical stage.
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