材料科学
微观结构
扩散阻挡层
透射电子显微镜
阻挡层
溅射沉积
图层(电子)
吸收(声学)
衍射
吸收边
扩散
薄膜
溅射
带隙
光电子学
光学
复合材料
纳米技术
物理
热力学
作者
Zile Wang,Bo Lai,Zhe Zhang,Chenyuan Chang,Yanqing Wu,Jiang Li,Runze Qi,Qiushi Huang,Zhong Zhang,Zhanshan Wang
标识
DOI:10.1021/acsami.4c22676
摘要
Al/Sc multilayers are potential optical elements to be used for the extreme ultraviolet range at wavelengths longer than the Sc M2,3 absorption edge. The existing research exhibits a significant gap concerning the incorporation of a barrier layer within the Al/Sc multilayer to enhance interface quality. A series of Al/Sc, Al/Sc/Mo, Al/Mo/Sc, and Al/Mo/Sc/Mo multilayers were fabricated by the direct-current magnetron sputtering technique. Grazing incidence X-ray reflectivity, transmission electron microscopy, selected area electron diffraction, energy-dispersive X-ray spectroscopy, X-ray diffraction, and X-ray absorption spectroscopy were used to investigate the effect of Mo barrier layers on interface properties and layer microstructure of Al/Sc multilayers. The results indicate that Mo barrier layers with a thickness of approximately 0.5 nm at different interfaces perform different functions. The Mo barriers at Al-on-Sc interfaces primarily play a role in suppressing the columnar crystallization of Al layers, contributing to the smoothening of interfacial roughness. The thin Mo layers at Sc-on-Al interfaces mainly act as antidiffusion barriers, preventing the diffusion of Al atoms into Sc layers. A model of the impact of Mo barrier layers on the interface diffusion and microstructure of Al/Sc multilayers has been established.
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