Using the LOCALF method, we have examined electric field distributions for high and low dielectric susceptibility cases through systematic variations of defect concentration and orientation. The addition of nonlinear susceptibility terms to the conventional linear contributions in the dielectric formalism incrementally perturbs both the electric field intensities and predicted dielectric constants, having a greater influence on low dielectric materials. These effects are modulate by the relative ratios of the linear and nonlinear susceptibility terms for a material due to polarization-derived changes. Nonlinear effects can have a strong influence on the magnitude of these changes; potentially obscuring predicted changes in dielectric response due to microstructural detail.