Holographic techniques using spatial light modulators applied to maskless photolithography

This work presents the application studies of holographic techniques using LCoS-SLM (Liquid Crystal on Silicon - Spatial Light Modulators) to replace the masks in photolithography process. Computer-generated holograms obtained from two images with known dimensions, simulating a Clear Field Mask and a Dark Field Mask, were applied to one LCoS-SLM connected to an holographic optical setup capable of reducing the reconstructed images, allowing the survey of the most relevant parameters of the photolithography process for the manufacture of fine structures and from their characterization identify the limits imposed by LCoS-SLM in the process. The results are good and presents excellent possibilities of a holographic system applied to processes of Maskless Photolithography.