灰度
材料科学
平版印刷术
抵抗
光学
紫外线
光电子学
无光罩微影
光刻
吸收(声学)
下一代光刻
X射线光刻
紫外线
纳米压印光刻
色差
亮度
极紫外光刻
紫外线辐射
3D打印
可见光谱
反射率
作者
Dongxu Ma,Yuxing Pang,Zhe Huang,Xiaoyong Tang,Jingquan Liu,Z. Li
标识
DOI:10.1109/mems64181.2026.11419434
摘要
The existing maskless grayscale lithography for Fabry-Pérot (F-P) cavity structural colors relies on point-by-point direct writing lithography, which suffers from low efficiency. We present a maskless ultraviolet (UV) grayscale lithography approach for printing F-P cavitybased structural color. The approach precisely modulates resist thickness in parallel via grayscale control and introduces a 405 nm UV post-exposure bleaching step to reduce absorption and enhance refractive index. Optimized F-P cavities achieve reflectance above 93 % and produce vivid, high-saturation colors. Simulation and experimental results confirm a clear correlation among exposure grayscale, residual resist thickness, and the color output. The proposed technique offers a high-throughput, costeffective route for large-area, high-resolution color printing with potential applications in anti-counterfeiting label, display and optical encoding.
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