材料科学
分解
硫黄
光催化
杂原子
X射线光电子能谱
催化作用
硫化物
解吸
光化学
电子转移
空位缺陷
吸附
氧气
电子定域函数
降级(电信)
离解(化学)
人工光合作用
键裂
Atom(片上系统)
金属
化学工程
反应中间体
无机化学
化学稳定性
物理化学
激进的
作者
Jundie Hu,Yanqi Tang,Lu Bai,Jiali Chen,Jiafu Qu,Yahui Cai,Xu Yan,Liangzhi Li,Weixin Zou,Xiaogang Yang,Dongyun Chen,Hong Bin Yang
摘要
ABSTRACT The rapid decomposition of freshly formed H 2 O 2 or key intermediates (e.g., *OOH, *H 2 O 2 ) on metal sulfide surfaces poses a significant challenge in photocatalytic synthesis, primarily due to their strong adsorption and inherently unbalanced interfacial charge transfer of these catalysts. Here, we engineer electron localization in ZnIn 2 S 4 via synergistic sulfur vacancy creation and oxygen backfilling (O,S v ‐OZIS) to tailor active sites, which effectively suppresses H 2 O 2 decomposition while boosting its photosynthesis by promoting *H 2 O 2 desorption and accelerating charge transfer. In situ XPS and DFT calculations reveal that the catalytic active sites shifts from S atoms in ZIS to Zn atoms adjacent to sulfur vacancies in O,S v ‐OZIS, thereby enhancing *H 2 O 2 desorption and inhibiting O─O bond scission in critical intermediates. Consequently, under light illumination, the H 2 O 2 decomposition rate decreases from 38.17% (pristine ZIS) to 9.42% (O,S v ‐OZIS). Furthermore, scaled‐up (2.0 L batch) and continuous‐flow systems under natural sunlight achieve H 2 O 2 concentrations of 3.3 and 1.42 mM, respectively. The as‐produced H 2 O 2 demonstrates effective performance in pollutant degradation and antibacterial applications. This work highlights electron‐localization engineering via defect tailoring and heteroatom backfilling as a general strategy to balance formation and stability in photocatalytic H 2 O 2 synthesis.
科研通智能强力驱动
Strongly Powered by AbleSci AI