氧气
X射线光电子能谱
铜
谱线
金属
价(化学)
分析化学(期刊)
薄膜
材料科学
电子
过渡金属
化学
核磁共振
纳米技术
催化作用
天文
有机化学
色谱法
物理
量子力学
生物化学
作者
L. Lozzi,M. Passacantando,P. Picozzi,S. Santucci,H. den Daas
出处
期刊:Surface Science
[Elsevier BV]
日期:1995-07-01
卷期号:331-333: 703-709
被引量:27
标识
DOI:10.1016/0039-6028(95)00067-4
摘要
The interaction between oxygen and the Fe/Cu(100) interface has been studied as a function of both the iron thickness and the oxygen exposure by means of UPS and XPS spectroscopies. A careful analysis of the Fe 2p spectra has shown that upon exposing Fe thin films (0.5-10 ML) to 10 4 L of oxygen there is always the formation of Fe 2 O 3 . Instead, when a copper surface containing 0.5 and 1 ML of iron has been exposed to increasing amounts of oxygen (1-10 4 L), the presence of both Fe 2+ and Fe 3+ is evident in the middle stage of the oxidation. The UPS spectra have shown a strong decrease of the Cu3d features when the Fe/Cu interface has been exposed to oxygen, even for very thin Fe films (0.5-1 ML). This behaviour can be interpreted in terms of a sizeable decrease of the mean free path of low energy valence band electrons when the iron film is oxidized with respect to that observed in metallic iron films
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