德拉姆
节点(物理)
过程(计算)
计算机科学
多重图案
高分辨率
材料科学
光电子学
蚀刻(微加工)
嵌入式系统
操作系统
纳米技术
工程类
抵抗
地质学
图层(电子)
遥感
结构工程
作者
Hsing-Chen Wu,Ming-Chi Liao,Eri Hirahara,Tomohiro Iwaki
摘要
For adopting DSA patterning technology to implementation of upcoming DRAM nodes, a novel, unique, and user-friendly wet etch process was introduced. Our concept performs for good etch selectivity in design which facilitates high resolution patterning, and potentially offers an alternative solution to conventional dry etch techniques especially where CD goes smaller with a higher aspect ratio. This paper will discuss more in detail the concept of wet chemistry and design strategy which were developed for processing PS-b-PMMA (polystyrene-b-polymethyl methacrylate) hole patterns for advanced nodes. Besides, we further open perspectives of our wet etch strategy to new process development which does not require UV cure. Preliminary experiment and successful demonstration on PS-b-PMMA-based hole patterns will also be discussed in this paper.
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