材料科学
X射线光电子能谱
硅化物
溅射
冶金
基质(水族馆)
蚀刻(微加工)
碳化物
涂层
氧化物
硼化物
氩
溅射沉积
图层(电子)
复合材料
薄膜
化学工程
硅
纳米技术
化学
海洋学
有机化学
地质学
工程类
作者
W. A. Brainard,Donald R. Wheeler
摘要
Radio frequency sputtering was used to deposit refractory carbide, silicide, and boride coatings on 440-C steel substrates. Both sputter etched and pre-oxidized substrates were used and the films were deposited with and without a substrate bias. The composition of the coatings was determined as a function of depth by x-ray photoelectron spectroscopy combined with argon ion etching. Friction and wear tests were conducted to evaluate coating adherence. In the interfacial region there was evidence that bias may produce a graded interface for some compounds. Biasing, while generally improving bulk film stoichiometry, can adversely affect adherence by removing interfacial oxide layers. in all cases but the iron oxide coverage was only complete on the preoxidized substrates. The film and iron oxides were mixed in the MoSi2 and Mo2C films but layered in the Mo2B5 films. In the case of mixed oxides, pre-oxidation enhanced film adherence. In the layered case it did not.
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