库仑阻塞
PMOS逻辑
物理
MOSFET
噪音(视频)
跨导
凝聚态物理
量子点
电气工程
光电子学
材料科学
电压
晶体管
量子力学
工程类
图像(数学)
计算机科学
人工智能
作者
HeeBong Yang,Marcel Robitaille,Xuesong Chen,Hazem Elgabra,Lan Wei,Na Young Kim
标识
DOI:10.1109/led.2021.3132964
摘要
We observe rich phenomena of two-level random telegraph noise (RTN) from a commercial bulk 28-nm p-MOSFET (PMOS) near threshold at 14 K, where a Coulomb blockade (CB) hump arises from a quantum dot (QD) formed in the channel. Minimum RTN is observed at the CB hump where the high-current RTN level dramatically switches to the low-current level. The gate-voltage dependence of the RTN amplitude and power spectral density match well with the transconductance from the DC transfer curve in the CB hump region. Our work unequivocally captures these QD transport signatures in both current and noise, revealing quantum confinement effects in commercial short-channel PMOS even at 14 K, over 100 times higher than the typical dilution refrigerator temperatures of QD experiments (<100 mK). We envision that our reported RTN characteristics rooted from the QD and a defect trap would be more prominent for smaller technology nodes, where the quantum effect should be carefully examined in cryogenic CMOS circuit designs.
科研通智能强力驱动
Strongly Powered by AbleSci AI