化学
烷基
卤化物
金属
联氨(抗抑郁剂)
吸附
金属卤化物
热稳定性
组合化学
无机化学
有机化学
色谱法
作者
Markku Leskelä,Mikko Ritala
出处
期刊:Journal de physique
[EDP Sciences]
日期:1999-09-01
卷期号:09 (PR8): Pr8-837
被引量:39
摘要
The requirements of ALD precursors differ from those of CVD concerning thermal stability, adsorption on the surface, and reactions towards each other In the first ALD experiments in the 70s clements (Zn, Cd, S), metal halides and non-metal hydrides (H 2 O, H 2 S) were used. In the 80s the selection of precursors widened to metal complexes (alkoxides, β-diketonates) and simple organometallics (alkyl compounds). In the 90s both new metal (Cp-compounds, alkylamides) as well as non-metal precursors (H 2 O 2 , O 3 , hydrazine) have been introduced. A characteristic feature of ALD is that surface groups play an important role as reactive sites for the next precursor pulse. The development of ALD precursors is limited by the small number of groups working in the field. It seems, however, that the precuror development is diverged and tailored molecules are designed for each process.
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