材料科学
晶体管
双极结晶体管
光电子学
基础(拓扑)
电子工程
异质结双极晶体管
硅锗
电气工程
工程物理
计算机科学
工程类
硅
数学
电压
数学分析
作者
Andreas Pawlak,Julia Krause,Wittkopf Holger,M. Schröter
标识
DOI:10.1109/ted.2016.2620601
摘要
The base series resistance is an important parameter for bipolar junction transistors and heterojunction bipolar transistor (HBTs). Although many methods have been proposed for its experimental determination, their results vary significantly. In this paper, the most widely used methods are reviewed and applied to SiGe HBTs of different technologies and generations including different device types, i.e. high-speed and high-voltage SiGe HBTs. The accuracy of the methods is evaluated by applying them to a sophisticated physics-based compact model, allowing to clearly detect and explain the causes for the observed inaccuracies or failures. The methods are then also applied to experimental data. In both cases, a large variety of device sizes have been investigated. This paper and its results provide insight into each method's accuracy, its application limits with respect to a technology, device size, and operating range as well as its requirements in terms of equipment and extraction effort.
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