化学气相沉积
纳米技术
范围(计算机科学)
工程物理
材料科学
数码产品
过程(计算)
生化工程
工艺工程
计算机科学
工程类
电气工程
程序设计语言
操作系统
出处
期刊:InTech eBooks
[InTech]
日期:2016-08-31
被引量:30
摘要
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
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