钼
原子层沉积
材料科学
图层(电子)
金属
沉积(地质)
冶金
化学工程
纳米技术
地质学
工程类
沉积物
古生物学
作者
Kees van der Zouw,Bernhard Y. van der Wel,Jacobus M. Sturm,Antonius A. I. Aarnink,R.A.M. Wolters,Dirk J. Gravesteijn,Alexey Y. Kovalgin
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2025-02-19
卷期号:43 (2)
摘要
A feasibility study was conducted into the atomic layer deposition (ALD) of metallic molybdenum from the molybdenum hexacarbonyl [Mo(CO)6] precursor. Without the use of a coreactant, Mo(CO)6 decarbonylates in a nonself-limiting fashion to form molybdenum oxycarbide (MoCxOy) films in the low-temperature regime between 100 and 250 °C. Introducing (atomic) hydrogen as a coreactant, in an attempt to drive self-limiting growth and provide metallic molybdenum films, caused hardly a difference in both film composition and growth kinetics. With ozone as a coreactant, an ALD process was developed to grow molybdenum oxide (MoO3) films without carbon contamination. The MoO3 ALD cycle times were optimized and the existence of an ALD window was investigated. The MoO3 films were subsequently reduced by atomic hydrogen to form metallic molybdenum at temperatures between 150 and 450 °C. The degree of reduction was shown to increase with the reduction temperature, with the limitation that the film exhibited multiple cracks after reduction at 450 °C. Spectroscopic ellipsometry, x-ray photoelectron spectroscopy, and scanning and transmission electron microscopy were employed for thin-film characterization.
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