光电探测器
光电子学
材料科学
响应度
紫外线
时滞与积分
高电子迁移率晶体管
集成电路
比探测率
晶体管
光学
紫外线辐射
图像传感器
辐射
产量(工程)
可扩展性
响应时间
作者
Shilong Zheng,Zhiyuan Liu,Wenjie Chen,Taiman Luo,Wanglong Wu,Yaqi Qu,Wei Gao,Nengjie Huo,Jingbo Li,Wenbo Xiao,Zhaoqiang Zheng,Mengmeng Yang
标识
DOI:10.1002/lpor.202502160
摘要
ABSTRACT The growing demands in deep‐space communication, environmental monitoring, and high‐resolution imaging necessitates ultraviolet photodetectors (UV PDs) with ultrahigh sensitivity, robust background radiation rejection, and high integration compatibility. To address this, we report a wafer‐scale UV PD array based on recessed‐gate AlGaN/u‐GaN/p‐GaN high‐electron‐mobility transistors (HEMT). The device exhibits unprecedented UV‐specific performance: exceptional responsivity of 1.16 × 10 6 A W −1 under 365 nm illumination, and a record‐specific detectivity of 1.69 × 10 17 Jones. Its rapid response dynamics (668.4 µs of rise time; 885.4 µs of fall time) and unparalleled UV/visible rejection ratio (R 365 /R 532 = 7.06 × 10 5 ) enable critical functionalities unattainable by conventional detectors. These include multi‐band optical communication, high‐resolution UV imaging immune to ambient light interference, and real‐time environmental UV monitoring via integrated circuit readout. Fabricated with 95% yield on a 10 × 10 array platform, this work establishes a scalable approach for next‐generation UV‐photonic systems.
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