材料科学
荧光
数值孔径
光学
显微镜
分辨率(逻辑)
紫外线
波长
聚苯乙烯
抵抗
荧光显微镜
分析化学(期刊)
光电子学
聚合物
纳米技术
化学
复合材料
物理
色谱法
图层(电子)
人工智能
计算机科学
作者
Shoichi Kubo,Tatsuya Tomioka,Masaru Nakagawa
标识
DOI:10.7567/jjap.52.06gj01
摘要
The authors investigated optical resolution limits to identify minimum distances between convex lines of fluorescent dye-doped nanoimprinted resist patterns by fluorescence microscopy. Fluorescent ultraviolet (UV)-curable resin and thermoplastic resin films were transformed into line-and-space patterns by UV nanoimprinting and thermal nanoimprinting, respectively. Fluorescence immersion observation needed an immersion medium immiscible to the resist films, and an ionic liquid of triisobutyl methylphosphonium tosylate was appropriate for soluble thermoplastic polystyrene patterns. Observation with various numerical aperture (NA) values and two detection wavelength ranges showed that the resolution limits were smaller than the values estimated by the Sparrow criterion. The space width to identify line patterns became narrower as the line width increased. The space width of 100 nm was demonstrated to be sufficient to resolve 300-nm-wide lines in the detection wavelength range of 575–625 nm using an objective lens of NA= 1.40.
科研通智能强力驱动
Strongly Powered by AbleSci AI