<title>Modeling of dielectric polarization during an electron beam exposure</title>

On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculations of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography.