Review of Recently Developed Plasma Nitriding Technologies

In order to overcome the inherent shortcomings of conventional plasma nitriding,new plasma nitriding technologies,such as active screen plasma nitriding,plasma source ion nitriding,ion implantation ion nitriding,were developed during recent years.The principles and characteristics of new technologies were introduced,and their same characteristic models in plasma nitriding were summatized.Active screen plasma nitriding and plasma source nitriding,which offer many advantages on equipments and techniques,will be the developmentdirection in plasma nitriding technology field.