Nanoscale Hydrophobic Recovery:  A Chemical Force Microscopy Study of UV/Ozone-Treated Cross-Linked Poly(dimethylsiloxane)

纳米尺度 材料科学 X射线光电子能谱 接触角 模数 显微镜 缩进 分析化学(期刊) 复合材料 弹性模量 化学工程 同质性(统计学) 化学力显微镜 纳米压痕 原子力显微镜 化学 开尔文探针力显微镜 纳米技术 色谱法 光学 非接触原子力显微镜 工程类 物理 统计 数学
作者
Henrik Hillborg,Nikodem Tomczak,Attila Oláh,Holger Schönherr,G. Julius Vancsó
出处
期刊:Langmuir [American Chemical Society]
卷期号:20 (3): 785-794 被引量:290
标识
DOI:10.1021/la035552k
摘要

Chemical force microscopy (CFM) in water was used to map the surface hydrophobicity of UV/ozone-treated poly(dimethylsiloxane) (PDMS; Sylgard 184) as a function of the storage/recovery time. In addition to CFM pull-off force mapping, we applied indentation mapping to probe the changes in the normalized modulus. These experiments were complemented by results on surface properties assessed on the micrometer scale by X-ray photoelectron spectroscopy and water contact-angle measurements. Exposure times of < or = 30 min resulted in laterally homogeneously oxidized surfaces, which are characterized by an increased modulus and a high segmental mobility of PDMS. As detected on a sub-50-nm level, the subsequent "hydrophobic recovery" was characterized by a gradual increase in the pull-off forces and a decrease in the normalized modulus, approaching the values of unexposed PDMS after 8-50 days. Lateral imaging on briefly exposed PDMS showed the appearance of liquid PDMS in the form of droplets with an increasing recovery time. Longer exposure times (60 min) led to the formation of a hydrophilic silica-like surface layer. Under these conditions, a gradual surface reconstruction within the silica-like layer occurred with time after exposure, where a hydrophilic SiOx-enriched phase formed < 100-nm-sized domains, surrounded by a more hydrophobic matrix with lower normalized modulus. These results provide new insights into the lateral homogeneity of oxidized PDMS with a resolution in the sub-50-nm range.
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