材料科学
牛顿流体
机制(生物学)
扩展(谓词逻辑)
剪应力
半径
自旋(空气动力学)
机械
蒸发
过程(计算)
计算机科学
复合材料
热力学
物理
量子力学
操作系统
程序设计语言
计算机安全
作者
Niranjan Sahu,Biswanath Parija,S. Panigrahi
标识
DOI:10.1007/s12648-009-0009-z
摘要
A mathematical model is derived to elucidate the dominant mechanism governing film formation. It leads to a relation between film thickness and film radius spreading with time. Inclusion of evaporation and shear stress was made with extension to non-Newtonian fluid. The advantages and disadvantages of this process with applications are reviewed.
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