Acrylic-based resin with favorable properties for three-dimensional two-photon polymerization
作者
Tommaso Baldacchini,Christopher N. LaFratta,Richard A. Farrer,Malvin C. Teich,Bahaa E. A. Saleh,Michael Naughton,John T. Fourkas
出处
期刊:Journal of Applied Physics [American Institute of Physics] 日期:2004-05-17卷期号:95 (11): 6072-6076被引量:203
标识
DOI:10.1063/1.1728296
摘要
We describe an acrylic-based prepolymer resin that is ideally suited for the fabrication of three-dimensional structures with two-photon polymerization. We characterize the photochemical and photophysical properties of the photoinitiator and present representative structures that demonstrate the favorable mechanical and optical properties of the polymer.