Microstructure and Mechanical Properties of TiN/Ti2AlN Multilayers

Titanium nitride (TiN) thin films deposited by high-power pulsed magnetron sputtering usually have a high compressive residual stress, which is not conducive for the adherence of TiN thin films. This study investigated the potential of Ti2AlN for releasing the compressive residual stress of HPPMS-deposited TiN thin films and evaluated the adherence strength and hardness of TiN/Ti2AlN multilayers by introducing the Ti2AlN MAX phase to form TiN/Ti2AlN multilayers. The results showed that smooth TiN/Ti2AlN multilayers with the TiN (111) and Ti2AlN (002) textures were successfully synthesized by HPPMS deposition and subsequent vacuum annealing. The compressive residual stress in TiN was released by Ti2AlN. The adherence strength of the TiN/Ti2AlN multilayers was improved after the release of the compressive residual stress, and the hardness of TiN/Ti2AlN multilayers was close to the annealed TiN. This study provides a novel approach for releasing the residual stress of hard ceramic thin films using the MAX phase.