记忆电阻器
材料科学
光电子学
辐照
中子
通量
降级(电信)
电压
辐射
中子通量
阈值电压
可靠性(半导体)
X射线光电子能谱
中子辐照
高压
辐射硬化
电容器
电阻随机存取存储器
功率(物理)
电子工程
辐射损伤
切换时间
光谱学
电气工程
空位缺陷
作者
Linyan Yao,Hongjia Song,Chuan Ma,Anan Ju,Zhao Fu,Hongxia Guo,Zicai Shen,Jinbin Wang,Xiangli Zhong,Xiaoping Ouyang
标识
DOI:10.1109/tns.2025.3626812
摘要
Threshold switching (TS) memristors have emerged as promising candidates for artificial neurons in brain-inspired chips due to advantages of easy integration, high density, and low power consumption. However, in aerospace applications, their performances are susceptible to degradation caused by radiation, posing a threat to the reliability of brain-inspired chips. Currently, the radiation degradation laws and mechanisms of TS memristors characteristics are not yet fully understood. In this paper, we firstly investigate the radiation damage law and mechanisms of Ta₂O₅: Ag-based TS memristors based on neutron source. Then the impact of neutron irradiation on the spike firing frequency of Leaky Integrate-and-Fire (LIF) neurons based on these devices are simulated using PSpice. The results indicate that as the neutron irradiation fluence increases, holding voltage, high resistance state, and on/off ratio of the memristors remain basically unchanged while the threshold voltage increases and the switching speed decreases. When the neutron fluence reaches 4.5×10¹² n/cm², the threshold voltage and on/off time of the memristor increase to 1.10~1.58 V and 39/42 ns respectively, which results in more stringent conditions for the LIF neuron to generate spike frequencies. X-ray Photoelectron Spectroscopy analysis reveals that the main reason for the degradation of device performance is the suppression of silver ion migration by irradiation-induced silver interstitial atoms and oxygen vacancy defects. The research findings offer support for the development of radiation-hardened high-speed memristor-based neurons and brain-inspired chips.
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