Using beam chemistries with SEM, FIB and DualBeam for surface modification

Charged particle beams in scanning electron microscope (SEM) and focused ion beam (FIB) equipment are generally used for imaging and direct surface modification of samples held under vacuum. However, by introducing small quantities of gas near to the sample surface whilst the beam is scanning, the FIB or SEM can accurately deposit or preferentially etch material. Consequently, this allows FIBs, SEMs and DualBeams (a combined FIB and SEM instrument) to quickly and easily custom make and modify a wide range of structures on a micro and nanoscale.