高电子迁移率晶体管
材料科学
分子束外延
光电子学
量子点
电压
晶体管
外延
灵敏度(控制系统)
电气工程
纳米技术
图层(电子)
电子工程
工程类
作者
Ruirong Wang,Hao Guo,Jun Tang,Jinping Liu,Lishuang Liu
出处
期刊:Micromachines
[Multidisciplinary Digital Publishing Institute]
日期:2021-11-18
卷期号:12 (11): 1413-1413
被引量:2
摘要
A force-sensitive structure of an InAs Quantum Dot (QD) embedded in a high electron mobility transistor (HEMT) is presented in this paper. The size of an InAs QD is about 30 nm prepared by the S-K growth mode, and the force-sensitive structure is fabricated by molecular beam epitaxy (MBE). The force-sensitivity characteristic of the QD HEMT is studied by the electrical and mechanical properties. The electrical characteristics show that the InAs QD-HEMT has linear, cut-off, and saturation operating states, and produces different output currents under different gate voltages, which shows that the structure is reasonable. Furthermore, the results of the output characteristics under different pressure show that the output voltage of the QD-HEMT decreases with the increase in pressure, which indicates that the InAs QD-HEMT has a vital mechanical-electrical coupling characteristic. The output voltage of the InAs QD-HEMT in the range of 0-100 kPa shows that the sensitivity was 1.09 mV/kPa.
科研通智能强力驱动
Strongly Powered by AbleSci AI