钻石
电场
等离子体
圆柱
材料科学
基质(水族馆)
微波食品加热
离子源
功率(物理)
核工程
机械
分析化学(期刊)
光学
原子物理学
化学
物理
机械工程
复合材料
热力学
工程类
色谱法
量子力学
地质学
海洋学
作者
Yizhuo Zhang,Shengwang Yu,Jie Gao,Yong Ma,Z. Y. He,Hongjun Hei,Kan Zheng
出处
期刊:Vacuum
[Elsevier]
日期:2022-06-01
卷期号:200: 111055-111055
被引量:6
标识
DOI:10.1016/j.vacuum.2022.111055
摘要
A novel microwave plasma chemical vapor deposition (MPCVD) reactor with three-cylinder cavity and outstanding tuning capability was proposed. The electric field and plasma in the reactor were simulated, and four geometric parameters were optimized. After optimization, the electric field intensity above the substrate exceeded 5×103V/m (input power of 1 W), which was 1.6 times that of the similar cylindrical reactors. Only one strong plasma formed above the substrate surface with an input power of 5 kW once the gas pressure exceeds 8 kPa. But the plasma coverage area was decreased with the increase of the gas pressure. The plasma coverage area could be restored by adjusting the height difference between the adjusting mechanism 1 and 2. The frequency detuning caused by the microwave frequency changes also could be returned by adjusting the adjusting mechanisms. The subsequent experimental results showed that uniform and high-quality diamond films could be deposited under the simulation condition (5 kW and 12 kPa). It could verify the accuracy of the simulation and the excellent performance of the new MPCVD reactor.
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