Study of the polishing slurry dispersant for chemical mechanical polishing of 304 stainless steel

分散剂 泥浆 抛光 六偏磷酸钠 材料科学 表面粗糙度 草酸 过氧化氢 硅酮 氯化物 冶金 化学机械平面化 复合材料 无机化学 化学 色散(光学) 有机化学 陶瓷 物理 光学
作者
Jianxiu Su,Xu Zhang,Qi Wangting,Xiaojun Cao,Zhankui Wang
出处
期刊:International Journal of Modern Physics B [World Scientific]
卷期号:36 (09n11) 被引量:1
标识
DOI:10.1142/s0217979222400264
摘要

To further clarify the effect of the polishing slurry dispersant on the chemical mechanical polishing (CMP) performance of 304 stainless steel, a series of tests were carried out. The correlation between the material removal rate (MRR), surface roughness of 304 stainless steel, dispersant composition, and their content was investigated under two kinds of polishing slurry (hydrogen peroxide oxidant and ferric chloride oxidant) conditions. The experimental results indicated that the MRR and surface roughness of 304 stainless steel arrived at the maximum when the content of sodium hexametaphosphate dispersant was 1.2% (wt) under the hydrogen peroxide–oxalic acid polishing slurry condition. The values of MRR and surface roughness were 146 nm/min and 10 nm, respectively. The MRR and surface roughness of 304 stainless also reached the maximum value as the content of the propanetriol dispersant was 1.2% (wt) under the ferric chloride–oxalic acid polishing slurry condition. However, the values of MRR and surface roughness were 457 nm/min and 22 nm, respectively. Therefore, sodium hexametaphosphate was recommended as the dispersant of hydrogen peroxide–oxalic acid polishing, and propanetriol was recommended as the dispersant of ferric chloride–oxalic acid polishing slurry condition, according to the above analysis. This study lays a theoretical foundation for the improvement of 304 stainless steel CMP performance.
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