化学
主组元素
第2组金属有机化学
反应性(心理学)
群(周期表)
金属有机气相外延
纳米技术
金属有机化学
化学气相沉积
有机化学
组合化学
分子
过渡金属
材料科学
催化作用
外延
病理
医学
替代医学
图层(电子)
标识
DOI:10.1016/s0065-3055(03)49006-0
摘要
This chapter discusses the synthesis, structure, reactivity, and potential applications of group 13/15 organometallic compounds. Binary group 13/15 materials, typically referred to as “III–V materials”, are semiconducting materials with several applications in opto- and micro-electronic devices. Usually, thin films of such materials are needed for the desired applications. The metal organic chemical vapor deposition (MOCVD) process is the most advantageous industrial process for the synthesis of thin films of such materials. It makes use of metalorganic precursors such as group-13 trialkyls. The chapter focuses on materials containing the heavier group-15 elements, such as Sb and Bi. Their synthesis required the development of an alternative synthetic pathway such as dehydrosilylation or distibine cleavage reaction. However, in particular, Bi-containing compounds are still very rare and their synthesis is still a challenge for preparative chemists working in this field of main-group element chemistry.
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