材料科学
高电子迁移率晶体管
光电子学
负载拉力
毫米
异质结
Ka波段
极高频率
基质(水族馆)
功率密度
功率(物理)
电气工程
电压
晶体管
光学
计算机科学
电信
物理
放大器
工程类
地质学
海洋学
量子力学
CMOS芯片
作者
S. Piotrowicz,Jean-Claude Jacquet,Piero Gamarra,O. Patard,C. Dua,E. Chartier,N. Michel,M. Oualli,C. Lacam,C. Potier,P. Altuntas,S.L. Delage
标识
DOI:10.1017/s175907871700112x
摘要
This paper presents performances achieved with InAlGaN/GaN HEMTs with 0.15 µm gate length on SiC substrate. Technology Computer Aided Design simulations were used to optimize the heterostructure. Special attention was paid to the design of the buffer structure. I-V measurements with DC and pulsed bias voltages were performed. CW measurements at millimeter waves were also carried out and are detailed in the following sections. The technology, optimized for power applications up to 45 GHz, demonstrates a current gain cut-off frequency F T of 70 GHz and a maximum available gain cut-off frequency F MAG of 140 GHz. CW Load-pull power measurements at 30 GHz enable to achieve a maximum PAE of 41% associated with an output power density of 3.5 W/mm when biased at V DS = 20 V. These devices, with an improved buffer structure show, reduced recovery time in pulsed operating conditions. These improved characteristics should have a positive impact for pulsed or modulated signal applications.
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