铜
材料科学
箔法
氧化物
扫描电子显微镜
氧化铜
微电子
印刷电路板
蚀刻(微加工)
复合材料
聚酰亚胺
化学工程
纳米技术
冶金
图层(电子)
工程类
操作系统
计算机科学
作者
Chong Wang,Xiang Lin,Yuanming Chen,Shouxu Wang,Dingjun Xiao,Wei He
标识
DOI:10.1080/01694243.2015.1016596
摘要
The adhesion strength of the interface between copper foil and resin is an important technological parameter for applications in microelectronics. In this study, a new brown oxidation solution of copper foil, including the recipe composition and reliability tests, was fully discussed. We provided an overview of brown oxidation process used in the semi-flexible printed circuit boards production industry by investigating the brown oxide film. The morphology of the copper oxide film was changed from lamellar structure to honeycomb structure with the increasing of oxidation time. The peel adhesion strength of the Cu/polyimide laminates was increased from about 2–16 N/cm by altering the immersion time and the concentration of inhibitors in brown oxidation solution. Scanning electron microscopy, peel tests and X-ray diffraction indicated that the higher adhesion strength was resulted from the rougher surface and the proper etching depth of copper foil, which was caused by chemical reactions on the interface surface of copper foil.
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