Film thickness control of resist on nanoimprint lithography

The relationship between the film thickness of polymer resist and the viscosity of polymer resist,the spin speed,spin coating time and dispensed polymer resist volume is studied for spin coating process on nanoimprint lithography. The experiments show that the relationship between them can be expressed as a power function,and there is no relationship between the film thickness and the dispensed polymer resist volume if the spin speed and spin coating time are comparatively high enough,the film thickness will not change and the minimum film thickness is obtained. The quantitative relationship between the polymer resist's film thickness and the viscosity of polymer resist,the spin speed,spin coating time is established. Hence,the film thickness control is realized.