材料科学
氮化硅
硅
等离子体增强化学气相沉积
光电子学
氮化硅
作者
Anton Buchberger,Jozef Pulko,Deborah Morecroft,Omar Basso,Jochen Kraft,Alexander Bergmann
出处
期刊:Conference on Lasers and Electro-Optics
日期:2021-05-09
标识
DOI:10.1364/cleo_at.2021.jth3a.84
摘要
Measurements of the width-dependent propagation loss of 250 nm thick silicon nitride strip waveguides at 850 nm wavelength indicate good agreement with the theoretical model. The waveguides were fabricated by plasma-enhanced chemical vapor deposition (PECVD).
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