材料科学
拓扑绝缘体
凝聚态物理
带隙
绝缘体(电)
碲化镉光电
导带
接口(物质)
光电子学
电子
拓扑(电路)
物理
量子力学
电气工程
工程类
毛细管作用
复合材料
毛细管数
作者
Shuyang Yang,Derek Dardzinski,Andrea Hwang,Dmitry I. Pikulin,Georg Winkler,Noa Marom
标识
DOI:10.1103/physrevmaterials.5.084204
摘要
First-principles simulations are conducted to shed light on the question of whether a two-dimensional topological insulator (2DTI) phase may be obtained at the interface between InAs and GaSb. To this end, the InAs/GaSb interface is compared and contrasted with the HgTe/CdTe interface. Density functional theory (DFT) simulations of these interfaces are performed using a machine-learned Hubbard U correction [npj Comput. Mater. 6, 180 (2020)]. For the HgTe/CdTe interface, our simulations show that band crossing is achieved and an inverted gap is obtained at a critical thickness of 5.1 nm of HgTe, in agreement with experiment and previous DFT calculations. In contrast, for InAs/GaSb, the gap narrows with increasing thickness of InAs; however, the gap does not close for interfaces with up to 50 layers (about 15 nm) of each material. When an external electric field is applied across the InAs/GaSb interface, the GaSb-derived valence band maximum is shifted up in energy with respect to the InAs-derived conduction band minimum until eventually the bands cross and an inverted gap opens. Our results show that it may be possible to reach the topological regime at the InAs/GaSb interface under the right conditions. However, it may be challenging to realize these conditions experimentally, which explains the difficulty of experimentally demonstrating an inverted gap in InAs/GaSb.
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