Evaluation of material property requirements and performance of ultra-low dielectric constant insulators for inlaid copper metallization
作者
Jeffrey T. Wetzel,S. H. Lin,E.M. Mickler,J. Lee,B. Ahlbum,C. Jin,Robert J Fox,M.-H. Tsai,W. Mlynko,Kenneth A. Monnig,Paul Winebarger
出处
期刊:Technical digest [Institute of Electrical and Electronics Engineers] 日期:2002-11-13卷期号:146: 4.1.1-4.1.3被引量:5
标识
DOI:10.1109/iedm.2001.979406
摘要
Technological challenges for selection and integration of ultra-low dielectric constant insulators are discussed. Correlations of material properties with their performance in 1 level-metal inlaid copper integration are established. Dielectric constants of candidate materials are estimated from line-to-line capacitance measurements and FEM. Implications regarding the changes in dielectric constant are discussed.