Preparation and measurement of an x-ray Laue-type monochromator based on a WSi2/Si multilayer

The Laue-type multilayer monochromator (LMM) is a promising optical element with a small size and high efficiency in a synchrotron radiation facility. By the dynamical diffraction theory, using DC magnetron sputtering technology, an LMM with a total thickness of 47 µm and a periodic thickness of 4.7 nm