NIL enabled mass production of visible meta-optics

Meta-optics have been gaining momentum in the last few years. The meta-atoms for IR range applications are large enough and can be patterned by traditional semiconductor lithography. Making meta-optics in the visible range of 400 to 600nm, the meta-atom structures become too small and the optical lithography falls short. Moxtek has established a manufacturing line enabled by nanoimprint lithography (NIL) that can pattern and build visible range meta-optics. This process has shown proven total efficiency greater than 90% at 532nm wavelength on a baseline over multiple lots. This data set for visible meta-optics, confirms that volume manufacturing of visible wavelength metalens is possible and the patterning barrier has been removed.