NIL enabled mass production of visible meta-optics
生产(经济)
计算机科学
经济
宏观经济学
作者
Bradley R. Williams,Daniel Bacon-Brown,M. C. George,Rumyana Petrova,Adam W. Korb,Jamie C. Stocks
标识
DOI:10.1117/12.3008763
摘要
Meta-optics have been gaining momentum in the last few years. The meta-atoms for IR range applications are large enough and can be patterned by traditional semiconductor lithography. Making meta-optics in the visible range of 400 to 600nm, the meta-atom structures become too small and the optical lithography falls short. Moxtek has established a manufacturing line enabled by nanoimprint lithography (NIL) that can pattern and build visible range meta-optics. This process has shown proven total efficiency greater than 90% at 532nm wavelength on a baseline over multiple lots. This data set for visible meta-optics, confirms that volume manufacturing of visible wavelength metalens is possible and the patterning barrier has been removed.