In situ polymerization threshold detection of 3-color systems and a study of the time dependence

A three-color lithographic (3CL) scheme has been developed to achieve high resolution through the use of visible and near IR wavelengths. The intrinsic kinetic properties of 3CL materials are used to optimize the efficiency of deactivation, a crucial step in overcoming background buildup in multipatterning using this technique. To study materials of interest for 3CL, we have developed an in situ technique to monitor exposure and deactivation. A two-beam interference pattern is polymerized on a photoresist and the diffraction of a continuous-wave probe laser is measured in order to identify the polymerization and deactivation thresholds. Here we present preliminary results on the time dependence of the deactivation efficiency of 3CL materials and in situ detection of polymerization thresholds. This is a study of the kinetics for polymerization of 3CL materials to optimize the 3CL scheme to achieve the highest resolution and elucidate its mechanism.