X射线光电子能谱
锡
分析化学(期刊)
椭圆偏振法
原子层沉积
沉积(地质)
材料科学
氧化锡
图层(电子)
氧化物
无机化学
化学
薄膜
化学工程
纳米技术
冶金
生物
工程类
古生物学
色谱法
沉积物
作者
Ganna Chistiakova,Mathias Mews,Regan G. Wilks,Marcus Bär,Lars Korte
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:2018-01-29
卷期号:36 (2)
被引量:9
摘要
Tin oxide (SnO2) layers were deposited using plasma enhanced atomic layer deposition with tetrakis(dimethylamino)tin precursor and oxygen plasma. The deposited layers were analyzed by spectral ellipsometry, conductivity measurements, and in-system photoelectron spectroscopy. Within a deposition temperature range of 90–210 °C, the resistivity of the SnO2 layers decreases by 5 orders of magnitude with increasing deposition temperature. At the same time, the refractive index at 632.8 nm increases from 1.7 to 1.9. These changes in bulk layer properties are connected to results from photoelectron spectroscopy. It is found that decreasing carbon and nitrogen contaminations in the tin oxide layers lead to decreasing optical band gaps and increasing refractive index. Additionally, for the deposited SnO2 layers, a shoulder in the O 1s core level spectrum is observed that decreases with the deposition temperature and thus is proposed to be related to hydroxyl groups.
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