晶体管
材料科学
极高频率
光电子学
毫米
高电子迁移率晶体管
电压
电气工程
极地的
功率密度
功率(物理)
物理
光学
工程类
天文
量子力学
作者
Brian Romanczyk,Steven Wienecke,Matthew Guidry,Haoran Li,Elaheh Ahmadi,Xun Zheng,S. Keller,Umesh K. Mishra
标识
DOI:10.1109/ted.2017.2770087
摘要
This paper reports on state-of-the-art millimeter-wave power performance of N-polar GaN-based metal-insulator-semiconductor high-electron-mobility transistors at 30 and 94 GHz. The performance is enabled by our N-polar deep recess structure, whereby a GaN cap layer is added in the access regions of the transistor to simultaneously enhance the access region conductivity while mitigating dc-to-RF dispersion. The impact of lateral scaling of the drain access region length is examined using the tradeoff between breakdown voltage and small-signal gain. Load-pull measurements are presented at 94 GHz, corresponding to the target device operating frequency in W-band, where the device demonstrated a peak power-added efficiency (PAE) of 28.8% at 16 V and record-high maximum output power density of 8 W/mm at 20 V. Additional load-pull measurements at 30 and 10 GHz demonstrate the viability of this device across a wide frequency range where the peak power remained constant at 8 W/mm and with peak PAEs of 56% and 58%, respectively.
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