材料科学
X射线光电子能谱
氧化铌
四方晶系
透射电子显微镜
分析化学(期刊)
铌
薄膜
外延
电子衍射
晶格常数
氧化物
分子束外延
金红石
结晶学
晶体结构
衍射
化学
核磁共振
纳米技术
光学
图层(电子)
物理
有机化学
冶金
色谱法
作者
Ajit Dhamdhere,Tobias Hadamek,Agham Posadas,Alexander A. Demkov,David J. Smith
摘要
Niobium oxide thin films have been grown by molecular beam epitaxy on SrTiO3 (STO) (111) and (La0.18Sr0.82)(Al0.59Ta0.41)O3 (LSAT) (111) substrates. Transmission electron microscopy (TEM) confirmed the formation of high quality films with coherent interfaces. Films grown with higher oxygen pressure on STO (111) resulted in a (110)-oriented NbO2 phase with a distorted rutile structure, which can be described as body-centered tetragonal. The a lattice parameter of NbO2 was determined to be ∼13.8 Å in good agreement with neutron diffraction results published in the literature. Films grown on LSAT (111) at lower oxygen pressure produced the NbO phase with a defective rock salt cubic structure. The NbO lattice parameter was determined to be a ≈ 4.26 Å. The film phase/structure identification from TEM was in good agreement with in situ x-ray photoelectron spectroscopy measurements that confirmed the dioxide and monoxide phases, respectively. The atomic structure of the NbO2/STO and NbO/LSAT interfaces was determined based on comparisons between high-resolution electron micrographs and image simulations.
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