噪声裕度
逆变器
网络拓扑
电子工程
材料科学
半导体
电子线路
二极管
CMOS芯片
拓扑(电路)
光电子学
电气工程
计算机科学
工程类
电压
晶体管
操作系统
作者
Dhanu Chettri,Ganesh Mainali,Na Xiao,Xiao Tang,Xiaohang Li
标识
DOI:10.1002/pssb.202300493
摘要
Wide bandgap (WBG) and ultrawide bandgap (UWBG) semiconductors in n‐type metal–oxide–semiconductor (n‐MOS) integrated circuits (ICs) are increasingly being explored for their potential applications in the rapidly developing field of electronics. This review comprehensively examines the role of n‐MOS inverters underpinned by WBG and UWBG semiconductors and their application possibilities. It delves into various n‐MOS inverter topologies, including resistive, enhancement or diode‐load, depletion‐load, and pseudo‐complementary MOS inverter topologies. Each topology's operational principles, unique advantages, and potential performance are elucidated in detail. Finally, these topologies are simulated using the Advanced Design System software for a fair comparison between various topologies. The literature and simulation results show that the pseudo‐D topology has the best gain and improved noise margin. The review methodology involves an extensive exploration of WBG/UWBG n‐MOS inverters to advance the current understanding of WBG/UWBG n‐MOS‐based ICs.
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